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Multi Arc Sputter Coating Machine / Thin Film Deposition Equipment For Ashtray

Atop Industry Co.,Ltd
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Atop Industry Co.,Ltd
City: Wuxi
Province/State: Jiangsu
Country/Region: China
Tel: 86-510-82858608
Contact Person:
Ms Tina

Multi Arc Sputter Coating Machine / Thin Film Deposition Equipment For Ashtray

Brand Name : ATOP
Model Number : ATZK
Certification : ISO9001
Place of Origin : Jiangsu, China (Mainland)
MOQ : 1 set
Price : By negotiation
Payment Terms : L/C, T/T
Supply Ability : 200 sets/year
Delivery Time : 60working days
Packaging Details : In film
Customization : Yes
Condition : New
Chamber Material : SUS304
After sale service : Engineers avaliable to service machinery oversea
Technology : Magnetron Sputtering
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ATOP Ashtray Multi Arc Magnetron Sputtering Vacuum Coating Machine


Equipment Configuration


Structure type:Vertical type or horizontal type

Chamber type:single door or double doors

Application Field



It applies to hardware,glass crafts,ceramic crafts,such us watches,mobile phone metal shell,sanitary

ware,mould,electronic products,crystal glass, glasses, cutlery, knives and so on.

You can make super-hard wear-resistant film coating, anti-corrosion film, decorative film(gold color,rose

gold,coffee,brown,bronze,blue,black,white,gray and other colors),it combined with magnetron sputtering

technique can be plated the multilayer composite membrane and manufactured plated stainless steel,

aluminum, titanium, tungsten and other metal films may be manufactured as coated TIN, TIC, TICN, TIALN,

CRN, CU, AU, diamond film (DLC), decorative film metal, film and non-metallic composite coating film and

its compounds film.


Main Feature

1. Magnetron sputtering principle is based on the theory of the cathode glow discharge, it expend the
cathode surface magnetic field near the work piece surface. Then it improves the sputtered atom
ionization rate. It keeps the magnetron sputtering uniformity, also can improve the surface shining effect.

2. The arc plasma evaporation source is reliable, it can work under 40A current in optimizing the cathode
and the magnetic field structure,. It will happen atomic diffusion between the coating and the material. It
also has the advantages that lon Beam Assisted Deposition.

3. Vacuum pumping system, electric control system and complete vacuum coating system can be
customized according to user requirements.


4. It equipments cryogenic ion secondary source, some substrate without heating the material, It can

directly do the cold plating film at room temperature, save energy, increase productivity.


5. The maximum of the temperature for tool coating chamber can 600 degrees, In addition to the tool

Coater coating applications require heating device, other applications do not need the device.



Product Name


ATOP Ashtray Multi Arc Magnetron Sputtering Vacuum Coating Machine


Vacuum Chamber Size

Decide according to the substrate size and output

Substrate


Hardware,glass crafts,ceramic crafts,such us watches,mobile phone metal

shell,sanitary ware,mould,electronic products,crystal glass, glasses, cutlery,

knives and so on


Coating Film

High-grade decorative coating.

Coating Color


Gold,rose gold,coffee,brown,bronze,blue,black,white,gray etc.


Applications


Hardware,glass crafts,ceramic crafts .

Structure


Vertical type ; horizontal type ; single door type ; double-door type.

Coating Material


Stainless steel, aluminum, titanium, tungsten and other metal films may
be manufactured as coated TIN, TIC, TICN, TIALN, CRN, CU, AU, diamond film

(DLC), decorative film metal, film and non-metallic composite coating film and its

compounds film.

Features


High pumping speed, high efficiency, energy saving, full automatic process

controller can be simple, reliable, beautiful.


Working principle



Magnetron sputtering working principle of vacuum coating machine, the so-called "splash", under the

action of the electrons in an electric field accelerates to the substrate in the process of collision with argon

atoms, ionization out large amounts of argon ions and electrons.The electron flies toward the substrate,

the argon ion speeds up the target material under the action of the electric field, sputtering out a large

number of target atom, and the neutral target atom (or molecule) is deposited on the substrate to form the

film.Secondary electron in accelerating to fly to the substrate by magnetic field in the process of lorentz

magnetic force, the influence of confined area near the target surface plasma, the plasma density in the

area is very high, secondary electron under the action of magnetic field around the target surface is

circular motion, the electron motion path is very long, constantly in the process of movement of the impact

ionization out large amounts of argon ion bombardment of target, after many times of collision of the

electron energy gradually reduce, cast off the yoke of the magnetic field lines, away from the target

material, the final deposition on the substrate.


Coating Samples














































































































Product Tags:

sputter coating equipment

      

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